도전과 혁신을 통하여 비상하는 회사
(주)이노맥스입니다.
■ Features
1. Different size of wafers can be processed (Options)
2. Possible to apply multi chemical in one chamber (3Chemicals)
3. Manual wafer loading or Automatic wafer loading (Options)
4. Up to 450mm Wafer & Mask (Thickness 100㎛)
5. Customized design is possible to meet customer's requirements
▶ Standard & Optional Nozzle (Nano, High pressure, Flux, Etc...)
6. Provide various types of Spin Chucks
▶ Vacuum Chuck, Bernoulli Chuck, Venturi Chuck, Edge Grip Chuck
■ Target Markets
1. QA or R&D Laboratories
2. Pilot Production lines
3. University / Institutes